As the semiconductor manufacturing industry drives technological advancement, the critical particle size continues becoming smaller. It requires supporting solutions for contamination monitoring that keep up with these advances. Wafers pass through many process tools during manufacturing rendering conventional metrology techniques too slow to react to real time events, thus requiring real-time monitoring at the wafer’s surface (where it matters).
With improved technology, particle events down to 10 nm can be quickly and precisely detected improving wafer handling and development techniques. Complete tool coverage can now be achieved using a single particle counter in combination with a multipoint manifold accessory specifically designed for nanoparticle transport. This technology can also be adapted to validate and control cleanliness of bulk gases being supplied in the industry.
- Learn the benefits of sampling down to 10 nm in order to see particle excursions that would have been missed with a standard 100 nm optical particle counter
- Leverage real-time particle data to troubleshoot problems and improve overall tool cleanliness using the first ever SmartManifold for nanoparticle transport
- Learn how to monitor inert bulk gases down to 10 nm
- Discover the new NanoAir10 condensation particle counter by Particle Measuring Systems, purpose built for ultra-low maintenance, revolutionary small form factor, and best zero count rate on the market at 10 nm with no false count subtraction
- Process Engineers and Technicians
- Equipment Engineers, Specialists and Technicians
- Process Development and Integration Engineers
- Manufacturing Engineers
- Equipment Maintenance Engineers
- Tool Engineers
- Fab Engineers
- Process Owners
- Equipment Operations Managers
- Process Control Engineers
- Metrology Engineers
- Gas Manufacturing Specialists
- Gas Equipment Engineers
- Gas Production Chemists
- Gas Distribution Managers
- Gas Safety Coordinators
- Quality Assurance Engineers or Coordinators
