New Technologies and Options for Real-Time Aerosol Particle Monitoring Within Semiconductor Process Tools

Semiconductor manufacturing drives technological advancement and requires supporting solutions for contamination monitoring that keep up with these advances. Wafers pass through many process tools during the manufacturing process, requiring real-time contamination data to protect wafers from damage.

The latest in aerosol particle monitoring technology offers immediate and continuous data that enables quick and precise detection of particle contamination during manufacturing processes with sensitivity for particles as small as 10 nm. In addition, complete tool coverage can now be achieved using a single particle counter in combination with a multipoint manifold accessory.

New possibilities for contamination control from the latest particle counting solutions
How to leverage real-time particle data to troubleshoot problems and improve overall tool cleanliness
The benefits of achieving complete tool coverage using a multipoint manifold system

When? June 8th, 2023

To meet the needs of our global audience, we are offering this webinar at two different times. Below are the available options along with some corresponding time examples; choose the best time for you.

Note: All registrants will receive a recording.

Option 1: Ideal for APAC/EMEA

• Examples of times are: 8:00 AM Berlin/Paris; 3:00 PM Seoul

Option 2: Ideal for AMER/EMEA

• Examples of times are 10:00 New York/ 4:00 PM Rome/Berlin/Paris

Webinar presented by:

David Green, Applications Engineer

David Green is an applications engineer at PMS and has a degree in physics from the University College London. He worked over 13 years in the field of particle metrology and joined PMS in 2013 as R&D Engineer.