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Characterization of Critical Factors Affecting the Stabilization Time of Particle Measurements in Ultra-Pure Water Systems

On Demand

DI Water Contamination Control on demand webinar

Particle measurements in ultra-pure water (UPW) systems can take a considerable time to return to a stable baseline after an event interrupt normal operation (such as maintenance shutdowns). A characterization study was performed to evaluate the contribution of critical factors to the stabilization time of measurements in UPW for particles 20 nm and above. It was found that invasive actions, such as installing new sample tubing and components, had the most significant impact on the stabilization time. In contrast, non-invasive actions, such as PTFE and PFA valve actuation and the typical warm-up period of the particle counter, had much less influence. It was also shown that specific measures, such as adequate flushing of new tubing and components and minimizing sample tubing lengths, can effectively reduce the particle clean-up time.

In this free webinar you’ll learn:

  • how long the liquid particle counter takes to clean up,
  • how long it takes for the unit to report stable data in ultra-pure water systems.

Who should attend:

All users of inline liquid particle counter, especially those working in the following departments:

  • Quality assurance
  • Process engineering
  • Production engineering
  • Facility engineering
Webinar Presented By:
Peter Sun
Application Manager, Particle Measuring Systems

Peter Sun brings over 15 years of experience in the semiconductor industry, specializing in process chemicals and contamination control. With a background in physical chemistry and a Bachelors degree in Chemistry, he supports manufacturers in improving yield and reliability through advanced contamination monitoring strategies. Peter has worked closely with cleanroom and process engineers to address airborne molecular contamination (AMC) and chemical purity challenges in high-tech manufacturing environments. He is based in Korea, where he collaborates with regional and global teams to deliver technical guidance on contamination monitoring. At Particle Measuring Systems, Peter contributes to supporting cleanroom performance across the semiconductor and microelectronics industries.

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