Chemical Batch Sampling Use Case Studies #1
The SLS-20 and Chem 20 system has been tested to sample contamination down to 20 nm in chemicals ranging from sulfuric acid to organic solvents. In this blog, we will be taking a look at the following process chemicals:
- Sulfuric acid
- PGME, PGMEA and PGEE
Sulfuric Acid
The SLS-20 and Chem 20™ system is able to differentiate one lot from another based on 20 nm particulate levels in sulfuric acid. The SLS-20 and Chem 20-HI system was able to differentiate Lot 1 from Lot 2 for different processes during production. Overall, Lot 1 was 10% cleaner than Lot 2. For both lots, particle concentration at 20 nm was about one order higher than at 50 nm, indicating some room for quality improvement.
PGME, PGMEA and PGEE
This section covers test results for: propylene glycol methyl ether (PGME), propylene glycol methyl ether acetate (PGMEA), and propylene glycol ethyl ether (PGEE) solvent-based chemicals. Under High Scatter Mode, the SLS-20 and Chem 20-HI system identified the cleanliness of PGME, PGMEA and PGEE samples down to 24 nm. The filtered PGME sample was nearly twice as clean as the non-filtered sample. The filtered PGMEA sample was nearly 20% cleaner than the non-filtered sample, and the filtered PGEE sample was nearly 50% cleaner than the non-filtered sample.
Stay tuned for more process chemical study results in our next blog, due out next week! Can’t wait? Download the full paper here.
Learn more about Particle Measuring Systems 20 nm particle counting solutions for batch sampling solutions:
