Airborne Molecular Contamination Monitoring Optimized for Lithography

Optimized Airborne Molecular Contamination Monitoring for Lithography

A new approach to monitoring airborne molecular contamination in lithography is presented by industry experts from Particle Measuring Systems (PMS). Recent technical advances have made it feasible to perform continuous real-time monitoring with significant advances in sensitivity and stability while minimizing sample tubing effects.

airborne molecular contamination monitoring per day AMC Particle Measuring Systems

These improvements are realized by using a small, low-cost monitor that is dedicated to monitoring a single location. A dedicated, point-of-use monitor offers the following advantages over a conventional multi-point sampling system: continuous monitoring, no missed contamination events, sample tubing lengths reduced from 20 – 30 meters to 2 – 3 meters, and 5 – 10x better sensitivity. Improvements in sensitivity and stability are realized through a dedicated monitor approach to molecular contamination monitoring. Because the monitor is continuously sampling the same environment, sample averaging can be used in a highly effective manner to reduce the …


molecular contamination monitor from Particle Measuring SystemsFind the right Airborne Molecular Contamination (AMC) monitoring solution for your application:


Relevant Airborne Molecular Contamination (AMC)  Monitoring Papers

AirSentry® II Molecular Contamination Analyzers Calibration and Troubleshooting

AMC Airborne Molecular Contamination Control in Clean Manufacturing Environments

Mobile AMC Monitoring System Speeds Detection, Localization and Troubleshooting of Molecular Contamination Sources

Airborne Molecular Contamination (AMC) Control in Advanced Lithography Applications


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