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Redefining Cleanroom & Minienvironment Control with Nanoparticle Monitoring

Duration: 1h
When? September 23, 2025
Time options:

Reliable nanometer resolution particle counting can be used to improve cleanroom and clean manufacturing processes. Historically, monitoring efforts surround micron-based technology and standards aimed at characterizing rooms and processes at the micron level. Condensation particle counting (CPC) technology enables nanometer detection for greater size sensitivity, but usually have complicated logistics to operation resulting in a lack of reliability. The NanoAir10 overcomes these difficulties. Its small form factor allows it to be used inside process tools and at locations where wafers is exposed as well as in conjunction with the ParticleSeeker Smart Manifold for semicontinuous monitoring. With the best zero count metric for nanometer CPCs on the market, NanoAir10 yields the most reliable 10 nm detection results. This webinar will cover cases where this technology has been used to improve cleanroom processes and clean manufacturing specifications to align with the demands outlined in the IRDS.

What you'll learn:
  • Shift from Micron to Nanometer Resolution for Cleanroom Monitoring
  • Addressing Reliability Challenges in Nanometer Particle Counting
  • Enhanced Monitoring Capabilities and Industry Alignment
Can’t attend? Don’t Worry!

Register for one of the sessions, we’ll send you the webinar recording afterwards.

 

Who should attend:
  • Cleanroom Validation Specialist and Operations Manager
  • Contamination Control Engineer
  • Airborne Molecular Contamination (AMC) Specialist
  • Environmental Monitoring Technician
  • Process Integration Engineer
  • Equipment Engineer/Tool Engineer
  • Fab Engineer
  • Wafer Process Engineer
  • Semiconductor Manufacturing Engineer
  • Metrology Engineer
  • Yield Enhancement Engineer
  • Applications Engineer (Cleanroom or Particle Monitoring)
  • Product Manager (Nanoparticle Detection Tools)
  • Technical Marketing Engineer
  • Field Service Engineer (CPC Systems)
  • Gas Equipment Engineer
  • Gas Distribution Manager
  • Bulk Gas Quality Specialist
  • Compressed Gas Monitoring Technician
  • Process Control and Manufacturing Process Engineer
  • Quality Assurance Engineer
Duration: 1h
When? September 23, 2025
Time options:
Webinar Presented By:
Benton Hutchinson
Benton Hutchinson
Product Line Manager

Benton is a Product Line Manager at Particle Measuring Systems, focused on aerosol, compressed gas, and airborne molecular contamination (AMC) monitoring in cleanrooms. With a background in chemical engineering and hands-on experience in the semiconductor and microelectronics industries, he helps manufacturers improve contamination control. Benton is an expert in detecting and reducing AMC and particle levels in critical environments, supporting high-yield production and cleanroom compliance. He has delivered technical training and presentations on cleanroom contamination topics around the world. Benton holds both a Bachelor’s and a Master’s degree in Chemical Engineering. At Particle Measuring Systems, he supports global innovation in cleanroom monitoring.

Lexi Lake
Lexi Lake
Applications Engineer

Lexi Lake, M.S., is an Applications Engineer at Particle Measuring Systems with expertise in aerosol, gas, and airborne molecular contamination (AMC) monitoring for cleanroom manufacturing. She works closely with pharmaceutical, biotech, semiconductor, and microelectronics companies to improve contamination control strategies. Previously, Lexi was an Aerobiology Engineer, where she led aerosol R&D and helped develop new microbial monitoring technologies. Her scientific background includes research on airborne pathogens and respiratory disease therapies. Lexi holds a Master of Science in Microbiology and a Bachelor of Science in Biology. She regularly shares her knowledge through presentations on viable and non-viable particle monitoring, airborne particle behavior, and contamination control.

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