In semiconductor / clean manufacturing environments, two aspects of molecular contamination control need to be understood: (1) the background levels of contamination existing under stable conditions, and (2) the elevated concentrations that occur during contamination events.
A new approach to monitoring airborne molecular contamination in lithography is presented by industry experts from PMS
This FAQ paper is a follow up to the webinar Controlling Quality in Advanced Optics Manufacturing. During this webinar there were many good questions about monitoring contamination in clean optics manufacturing environments. Many of these questions were answered during the webinar and a few were submitted later. Please read below to see all the webinar questions, or submit your additional questions directly to us.
Decreasing the time to detect, contain and mitigate very low levels of Airborne Contamination (AMC) is becoming more critical for high tech manufacturers. Costs associated with AMC-related quality issues and yield losses are well understood, and adequate reduction of AMC is critical for clean manufacturers to stay competitve. A mobile AMC monitoring system speeds molecular contamination detection, localization and troubleshooting of sources. Learn more…
