This technical paper presents real-world case studies showing how nanometer-level particle monitoring improves control across critical semiconductor manufacturing processes.
Application Note
Extended Use Cases of NanoAir™ 10 and ParticleSeeker™ Instruments
The NanoAir™ 10 condensation particle counter delivers reliable nanometer-resolution detection, taking cleanroom and manufacturing monitoring beyond traditional micron-level methods. Its compact, user-friendly design with an enclosed, long-lasting working fluid reservoir enables deployment inside process tools and with the ParticleSeeker™ Smart Manifold for semicontinuous monitoring. This paper explores case studies and expands upon earlier findings on airborne nanoparticle detection with NanoAir™ 10 and ParticleSeeker™ instruments.
Unlock the Power of Nanometer-Resolution Particle Detection in Semiconductor Manufacturing
Semiconductor cleanroom processes are evolving—particle sizes that impact yield are shrinking, and traditional micron-level monitoring is no longer enough. Nanometer-resolution particle counting offers the sensitivity you need to protect critical processes and maintain production excellence. The NanoAir™ 10 condensation particle counter and ParticleSeeker™ Smart Manifold deliver reliable, actionable data at the nanometer scale, helping quality engineers enhance process control, reduce yield loss, and meet IRDS™ standards.
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Case Studies Highlighting Airborne Nanoparticle Detection
Our study explores eight practical case studies demonstrating the use of NanoAir™ 10 and ParticleSeeker™ Instruments in semiconductor environments, including:
- Monitoring nanoparticles during spin-dry cleaning processes.
- Detecting emissions from ionizers in EFEM tools.
- Characterizing particle generation between load ports and EFEM systems.
- Monitoring nanoparticles in DUV lithography.
- Evaluating bulk gas, CDA, and parts purge performance.
Each case highlights how precise airborne nanoparticle detection enables engineers to make informed process improvements, optimize equipment design, and reduce potential yield loss.
