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Application Note

Precision at the Source: Particle Control for Semiconductor Chemical Suppliers

As semiconductor devices become increasingly complex and critical particle sizes shrink into the sub-10 nm range, controlling yield-impacting contamination becomes increasingly important. Until recently, a significant sensitivity gap existed between critical particle sizes and the detection limits of traditional chemical particle counters. With industry-leading 20 nm sensitivity, the Chem 20™ chemical particle counter provides a comprehensive solution for controlling and mitigating particle contamination in ultra-pure chemical applications. The use cases presented here demonstrate how the Chem 20 can be utilized across the microelectronics industry by semiconductor manufacturers, chemical suppliers, and tool and component suppliers.

Ensuring Purity at the Nanometer Scale: A Quality Control Imperative for Semiconductor Chemical Suppliers

A Guide for Quality Control Engineers

For quality control engineers at semiconductor chemical suppliers, identifying and controlling sources of contamination throughout chemical production, storage, and delivery is essential to maintaining product quality. The Chem 20™ chemical particle counter provides the visibility needed to evaluate particle contamination in high-purity chemicals, support supplier qualification, verify filtration performance, and monitor critical process steps throughout the chemical supply chain.

Why This Matters

Chemical suppliers and semiconductor manufacturers increasingly rely on particle measurements at the smallest detectable sizes to identify contamination that may otherwise go unnoticed. By providing actionable particle data in ultra-pure chemical applications, the Chem 20 enables more informed decisions regarding chemical quality, process optimization, filtration effectiveness, and container qualification.

Key Applications

  • Inline verification before dispatch: Verify chemical purity before shipment and identify contamination introduced during filling or from shipping containers.
  • Supplier benchmarking: Compare incoming chemicals and uncover particle differences that may be undetectable with less sensitive measurement methods.
  • Filter performance monitoring: Evaluate filter conditioning, aging, and readiness for production using real-time particle data.
  • Process optimization: Support filter wetting protocols and validate cleaning processes used in applications such as mask-blank preparation.

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