Identifying and Tracing Airborne Molecular Contamination in Semiconductor Cleanrooms
This webinar explores how AMCs form, how it migrates through cleanroom environments, and why early detection is essential for safeguarding advanced process nodes.
Airborne molecular contamination (AMC) presents a critical threat to semiconductor manufacturing, impacting yield, device performance, and long‑term reliability. This webinar explores how AMCs form, how it migrates through cleanroom environments, and why early detection is essential for safeguarding advanced process nodes. Attendees will learn practical strategies for identifying contamination sources using both fixed and mobile monitoring technologies. Finally, we will outline best practices for tracing AMC events and implementing corrective actions that strengthen overall cleanroom contamination control programs.
Who should attend:
- Cleanroom Manager
- Cleanroom Operations Manager
- Semiconductor Process Engineer
- Contamination Control Engineer
- AMC Engineer
- Environmental, Health & Safety (EHS) Engineer
- Yield Enhancement & Management Engineers
- Facilities Engineers and Technicians
- Metrology Engineers and Managers
- Tool Owner
- Equipment Engineer
- R&D Scientist
- Materials Scientist
- Quality Assurance & Quality Control Engineers
- Field Service Engineer
- Manufacturing Engineer
- Production Engineer
Speakers
Benton Hutchinson
Product Line Manager
Benton is a Product Line Manager at Particle Measuring Systems, focused on aerosol, compressed gas, and airborne molecular contamination (AMC) monitoring in cleanrooms. With a background in chemical engineering and hands-on experience in the semiconductor and microelectronics industries, he helps manufacturers improve contamination control. Benton is an expert in detecting and reducing AMC and particle levels in critical environments, supporting high-yield production and cleanroom compliance. He has delivered technical training and presentations on cleanroom contamination topics around the world. Benton holds both a Bachelor’s and a Master’s degree in Chemical Engineering. At Particle Measuring Systems, he supports global innovation in cleanroom monitoring.
