20 nm Chemical Batch Sampling Solution with the SLS-20 Syringe Sampler
Particle size specification for process chemicals is a critical quality control for the semiconductor industry.
Particle size specification for process chemicals is a critical quality control for the semiconductor industry. Leading-edge microelectronics manufacturers require very clean process chemicals that are rigorously monitored for contamination and filtered to a particle size of 20 nm or below.
Watch this webinar to learn about the world’s leading 20 nm chemical contamination monitoring solution, the Chem 20 particle counter from Particle Measuring Systems, and how it combines with the SLS 20 sampler for a complete batch sampling solution. Topics covered include:
- Product features
- Overcoming Background Scatter
- Laser Safety
- Sensing Bubbles in Sample Flow
- Handling a Reduction in Sample Flow
- Leak Detection
- Obtaining Stable and Repeatable Data
- Pre-Sampling Processes
- Container Cleaning
- Flushing
- Sample Waste
- Switching Chemicals
- Use Cases of Different Chemicals
Speakers
Siwei Wang
Applications Engineer, Particle Measuring Systems
Siwei Wang, Ph.D., is an Applications Engineer specializing in liquid particle counters and contamination monitoring solutions for high-purity manufacturing processes. With a doctorate in Mechanical Engineering from the University of South Carolina, he brings over a decade of experience in electronics manufacturing, research, and development. Siwei supports global semiconductor and microelectronics customers with process optimization, particle contamination control, and advanced data analysis. He regularly presents on fluid particle monitoring and defect reduction strategies in critical cleanroom environments. At Particle Measuring Systems, a recognized leader in contamination monitoring, Siwei contributes to the development and application of precision liquid particle measurement technologies.
Dwight Beal
Global Product Line Manager Liquids
With more than 35 years of technical leadership in liquid particle contamination monitoring, Dwight Beal is recognized globally for advancing contamination control strategies in cleanroom manufacturing. His work has directly influenced how microelectronics and life sciencesĀ industries approach sampling accuracy, data reliability, and system validation. A trusted advisor to scientists, engineers, and quality professionals, Dwight is known for delivering high-impact solutions to complex contamination challenges. He has educated industry audiences worldwide through in-depth training on liquid particle counting, data management, and regulatory compliance.
