Monitoring Particles in Process Chemicals

Abstract

High particle levels in process chemicals have been shown to directly affect product quality. The need for continued reductions in particle size and quantity in cleanroom environments is well established. The International Technology Roadmap for Semiconductors (ITRS), sponsored by the United States Semiconductor Industry Association (SIA), defines the need for persistent decreases in particle levels in process gases, water, chemicals, and air in order to meet future generation technology nodes. The ability to accurately measure these contaminants is the first step in developing a comprehensive particle control plan.

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