Particle Monitoring in Process Chemicals
High particle levels in process chemicals have been shown to directly affect product quality. The need for continued reductions in particle size and quantity in cleanroom environments is well established. The International Technology Roadmap for Semiconductors (ITRS), sponsored by the United States Semiconductor Industry Association (SIA), defines the need for persistent decreases in particle levels in process gases, water, chemicals, and air in order to meet future generation technology nodes. The ability to accurately measure these contaminants is the first step in developing a comprehensive particle control plan.
Interested in learning more?
Complete the form to receive a free copy of this paper.
Relevant Blogs
20 nm Chemical Batch Sampling Solution with the SLS-20 Syringe Sampler
Effective Batch Sampling Down to 20 nm with the SLS-20 Batch Sampler
Chemical Particle Counting to 20 nm with the SLS-20 Batch Sampler
Relevant Webinars
Monitoring Guidelines for the Control of Particle Contamination in High-Purity Process Chemicals
Relevant Papers
20 nm Chemical Batch Sampling Solution with the SLS-20 Syringe Sampler
Uncovering chemical quality improvements through a holistic approach to chemical quality management