Airborne Molecular Contamination (AMC) Monitoring
For Advanced DUV and EUV Lithography, Optical Metrology, Precision Optics, and Laser Manufacturing
The fabrication of Photolithography masks, reticles, and other precision optical components which are both defect-free and surface-contaminant-free is of critical importance within the Lithography (“Litho”) and metrology functional areas within microelectronics manufacturing. The need for real-time Airborne Molecular Contamination (AMC) monitoring is well established within these industries wherever optical components are manufactured and used for actinic or inspection purposes. This paper will detail the benefits and applications of Ion Mobility Spectrometry (IMS) using Particle Measuring Systems‘ AirSentry® II (ASII) Real-time AMC Analyzer within the Litho, Metrology, and Photo Optical lens manufacturing areas.
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