Uncovering Chemical Quality Improvements Through a Holistic Approach to Chemical Quality Management
As semiconductor devices continue to scale, understanding and controlling particle contamination throughout the chemical supply chain becomes increasingly important. This paper explores a holistic approach to monitoring particles in ultra-pure chemicals, from the supplier to the wafer surface, and highlights opportunities to improve chemical purity, process control, and ultimately wafer yield.
This paper,Ā Written by Nora Colligan, Samsung Austin Semiconductor, examines monitoring particles in ultra-pure chemicals across the semiconductor manufacturing ecosystem, from chemical production through delivery to the wafer surface. As technology advances and process requirements become more demanding, greater visibility into contamination sources is essential for improving cleaning processes, equipment performance, and chemical delivery systems. Recent advances in particle monitoring now enable liquid particle measurements at sizes comparable to those evaluated in wafer metrology, creating new opportunities to understand the relationship between liquid-borne contamination and wafer defects. The paper presents examples of contamination-reduction opportunities throughout the supply chain and discusses the ongoing effort to better correlate liquid particle counts with wafer particle levels and yield outcomes.
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