This blog explores the pivotal role of real-time aerosol particle monitoring in semiconductor manufacturing, specifically focusing on the innovative solution provided by Particle Measuring Systems’
There is a need for more control of deleterious environmental contamination, including better detection and real-time response to undesired AMC concentration levels, the most prevalent of which are the amines class of AMCs.
Wet process equipment contains many components that are potential sources of particle contamination, and the ability to troubleshoot highly contaminating components in real-time without the need for offline laboratory analysis offers a significant benefit to equipment manufacturers.
Data from the Chem 20™ Chemical Particle Counter can inform manufacturers on the benefit of strategic filtration systems. In this blog, we look at cleaning systems for ultrapure water and potassium hydroxide.
