Tag: litho

NewsAirborne molecular contamination

Airborne Molecular Contamination Application in Precision Optical Component and Sub-System Manufacturing

The 24/7 real-time POU analyzers sampling scheme is part of the comprehensive AMC control plan to deliver lenses of optimal performance to litho and Metrology Tools OEMs.

NewsSemiconductor Particle Monitoring for semiconductor

Airborne Molecular Contamination (AMC) Control in Precision Optical Lens Manufacturing

Real-time AMC monitoring in the optical component and sub-system manufacturing facility becomes a leading indicator of effective quality and reliability of the component and sub-system.

NewsLithography Defects Caused by AMC

Lithography Defects Caused by AMC (Airborne Molecular Contamination) in the Functional Area

There is a need for more control of deleterious environmental contamination, including better detection and real-time response to undesired AMC concentration levels, the most prevalent of which are the amines class of AMCs.

NewsAMC contamination

AMC Contamination – Caused Optical Haze Formation

A major objective in eliminating defects in these processes involves preventing the formation of haze on mirrors, lenses, masks, reticles, prisms and other optical components.

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