On Demand

20 nm Chemical Batch Sampling Solution with the SLS-20 Syringe Sampler

 

Particle size specification for processChemical Batch Sampling webinar chemicals is a critical quality control for the semiconductor industry. Leading-edge microelectronics manufacturers require very clean process chemicals that are rigorously monitored for contamination and filtered to a particle size of 20 nm or below.

Attend this webinar to learn about the world’s leading 20 nm chemical contamination monitoring solution, the Chem 20 particle counter from Particle Measuring Systems, and how it combines with the SLS 20 sampler for a complete batch sampling solution. Topics covered include:

  • Product features
    • Overcoming Background Scatter
    • Laser Safety
    • Sensing Bubbles in Sample Flow
    • Handling a Reduction in Sample Flow
    • Leak Detection
    • Obtaining Stable and Repeatable Data
  • Pre-Sampling Processes
    • Container Cleaning
    • Flushing
  • Sample Waste
  • Switching Chemicals
  • Use Cases of Different Chemicals

 

Webinar Presented By:
Siwei Wang
Applications Engineer, Particle Measuring Systems

Siwei Wang has extensive experience in electronics manufacturing and R&D. In 2013, he obtained his Ph.D in Mechanical Engineering at University of South Carolina, Columbia, USA. Siwei is currently working as an Applications Engineer for Liquid Products at Particle Measuring Systems. In his spare time, Siwei enjoys playing soccer and traveling.

Dwight Beal
Global Product Line Manager Liquids

Dwight Beal’s experience exceeds 35 years working directly with industry professionals, scientists, and engineers to provide reduced sampling variation using particle contamination monitoring for liquid applications. He understands the challenges customers experience and is well-known in the industry for providing the best contamination monitoring and data management solutions.