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20 nm Batch Sampling of Process Chemicals

Particle size specification for process chemicals is a critical quality control for the semiconductor industry. Leading-edge microelectronics manufacturers require very clean process chemicals that are rigorously monitored for contamination and filtered to a particle size of 20 nm or below.

Attend this webinar to learn about the world’s only 20 nm chemical contamination monitoring solution, the Chem 20 particle counter from Particle Measuring Systems, and how it combines with the SLS 20 sampler for a complete batch sampling solution. Topics covered include:

  • sulfuric-acid-studyProduct features
    • Overcoming Background Scatter
    • Laser Safety
    • Sensing Bubbles in Sample Flow
    • Handling a Reduction in Sample Flow
    • Leak Detection
    • Obtaining Stable and Repeatable Data
  • Pre-Sampling Processes
    • Container Cleaning
    • Flushing
  • Sample Waste
  • Switching Chemicals
  • Use Cases of Different Chemicals

Date: May 6

cyclohexanone-studyRegistration

To meet the needs of our global audience, we are offering this webinar at two times. Below are the options along with some time examples. Note: to receive a post event recorded version, register for either event.

Option 1: Ideal for APAC/EMEA
Examples of times are: 2:00 PM Berlin/Paris; 8 PM Shanghai, 9PM Seoul

 

 

Option 2: Ideal for AMER/EMEA
Examples of times are: 4:00 pm New York, 1:00 PM Los Angeles, 10:00 PM Rome/ Berlin

  • Presenter

    Siwei Wang

    Applications Engineer, Particle Measuring Systems

    Siwei Wang has extensive experience in electronics manufacturing and R&D. In 2013, he obtained his Ph.D in Mechanical Engineering at University of South Carolina, Columbia, USA. Siwei is currently working as an Applications Engineer for liquids at Particle Measuring Systems. In his spare time, Siwei likes playing soccer and traveling.

  • Presenter

    Dwight Beal

    Global Product Line Manager Liquids

    Dwight Beal’s experience exceeds 35 years working directly with industry professionals, scientists, and engineers to provide reduced sampling variation using particle contamination monitoring for liquid applications. He understands the challenges customers experience and is well-known in the industry for providing the best contamination monitoring and data management solutions.