Conventional approaches to contamination control are changing. They are being driven by the need to anticipate contamination events, rather than simply react to them, and new regulations are supporting this shift in thinking. Defining a Contamination Control Strategy (CCS) is unique for each process and requires an intimate understanding of both the process and how to implement an effective strategy. This blog series will go into depth on both topics.
How Tubing Affects Particle Counts
Multiple mechanisms emerge when sample tubing of any length is placed between the sampling location and the particle counter inlet probe. By standardizing set-up variation where possible, these mechanisms are further classified into their principal loss mechanisms.
PMS and EMS Working Together to Deliver a Contamination Control Solution to an AUSTAR Customer
In this video interview, the team from AUSTAR UK discuss why and how they worked with Particle Measuring Systems’ (PMS) exclusive UK distributor, EMS Particle Solutions, to provide an AUSTAR sterility test isolator customer with a complete viable and non viable particle counting solution using PMS instrumentation and equipment.
Airborne Molecular Contamination Application in Precision Optical Component and Sub-System Manufacturing
The 24/7 real-time POU analyzers sampling scheme is part of the comprehensive AMC control plan to deliver lenses of optimal performance to litho and Metrology Tools OEMs.
Airborne Molecular Contamination (AMC) Control in Precision Optical Lens Manufacturing
Real-time AMC monitoring in the optical component and sub-system manufacturing facility becomes a leading indicator of effective quality and reliability of the component and sub-system.
Lithography Defects Caused by AMC (Airborne Molecular Contamination) in the Functional Area
There is a need for more control of deleterious environmental contamination, including better detection and real-time response to undesired AMC concentration levels, the most prevalent of which are the amines class of AMCs.
AMC Contamination-Caused Optical Haze Formation on Surfaces
A major objective in eliminating defects in these processes involves preventing the formation of haze on mirrors, lenses, masks, reticles, prisms and other optical components.
Real-Time AMC Monitoring in Lithography to Prevent Defects
The successful implementation of advanced litho techniques has meant that the roadmap’s major challenges are no longer resolution dependent…
The Antibacterial MiniCapt® Mobile – For Best-in-Class Microbial Contamination Monitoring
The new MiniCapt® Mobile microbial contamination monitoring instrument, now with antibacterial housing to further reduce contamination introduced during monitoring activities.
Semiconductor Particle Contamination Control
Wet process equipment contains many components that are potential sources of particle contamination, and the ability to troubleshoot highly contaminating components in real-time without the need for offline laboratory analysis offers a significant benefit to equipment manufacturers.
