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Without measurement there is no control
December 20, 2016 09:15:48 PM
Kim Jong-choul, country manager of American semiconductor systems provider, Particle Measuring System, says all his life as an engineer and CEO of a research center has been about problem-solving.
March 15, 2016 12:28:31 PM
As environmental system designers, we are often asked where to place sample points for particle monitoring, whether it be performed in a pharmaceutical cleanroom or clean device (RABS, isolator, etc.).
February 24, 2016 10:20:02 AM
Through continuous process and equipment advancements, semiconductor manufacturers are approaching 14 nm feature sizes and heading even smaller, while hard-disk drive fly heights are now less than 10 nm. This ever-reducing device feature size requires comparable cleanliness-level improvements in ultrapure water (UPW). UPW purity is especially important with its high use in direct contact with wafers as a final cleaning and rinsing agent in many production steps. Leveraging recent advances in laser optics and detector technology, UPW particle concentration ≥20 nm (≥9 nm for metallic particles) can be effectively monitored.
February 15, 2016 04:22:16 PM
전통적인 세계적인 세미콘 흐름에 맞춰, PMS는 1월 세미콘 코리아에서 주목할 만한 부스 프레젠테이션을 선보였습니다. 부스의 전체 테마는 “1972년부터 시작된 오염물질 모니터링의 세계적인 전문가” 였습니다. PMS는 광범위한 범위의 반도체 회사들로부터 나온 220여 명의 방문객을 만났습니다. 대부분의 방문객들은 한국인들이었지만 중국, 대만, 일본, 말레이시아, 미국, 그리고 유럽 방문객도 상당 수 있었습니다.
February 11, 2016 11:45:42 AM
Are your particle counters ISO 14644-1 compliant and able to be calibrated to all required tests according to ISO 21504-4?
February 4, 2016 09:55:06 AM
The recent revision of ISO 14644-1 and-2 has introduced several changes for cleanroom classification and monitoring guidelines. This paper highlights the major changes in the new ISO 14644-1 compared to the previous version, as well as the possible impact on the Pharmaceutical EU GMP Annex 1 and FDA Aseptic Processing Guideline.
August 12, 2015 10:30:47 AM
Aerospace greets a new dawn: Private companies now compete for opportunities to explore the boundaries of space. These ongoing aerospace opportunities demand newer ideas for detecting and reducing particulate contamination. Fewer particle-induced defects lead to higher yields, lower cost and greater reinvestments in aerospace development. Combined with the rapid advances in microelectromechanical systems (MEMs), detecting nanoparticles is critical. There are emerging particle counting technologies for aerospace industries that give data analysis to help decisions on mission-critical operations and minimize particulates in processes.