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Kim Jong-choul, country manager of American semiconductor systems provider, Particle Measuring System, says all his life as an engineer and CEO of a research center has been about problem-solving.

As environmental system designers, we are often asked where to place sample points for particle monitoring, whether it be performed in a pharmaceutical cleanroom or clean device (RABS, isolator, etc.).

Through continuous process and equipment advancements, semiconductor manufacturers are approaching 14 nm feature sizes and heading even smaller, while hard-disk drive fly heights are now less than 10 nm. This ever-reducing device feature size requires comparable cleanliness-level improvements in ultrapure water (UPW). UPW purity is especially important with its high use in direct contact with wafers as a final cleaning and rinsing agent in many production steps. Leveraging recent advances in laser optics and detector technology, UPW particle concentration ≥20 nm (≥9 nm for metallic particles) can be effectively monitored.

전통적인 세계적인 세미콘 흐름에 맞춰, PMS는 1월 세미콘 코리아에서 주목할 만한 부스 프레젠테이션을 선보였습니다. 부스의 전체 테마는 “1972년부터 시작된 오염물질 모니터링의 세계적인 전문가” 였습니다. PMS는 광범위한 범위의 반도체 회사들로부터 나온 220여 명의 방문객을 만났습니다. 대부분의 방문객들은 한국인들이었지만 중국, 대만, 일본, 말레이시아, 미국, 그리고 유럽 방문객도 상당 수 있었습니다.

Are your particle counters ISO 14644-1 compliant and able to be calibrated to all required tests according to ISO 21504-4?

The recent revision of ISO 14644-1 and-2 has introduced several changes for cleanroom classification and monitoring guidelines. This paper highlights the major changes in the new ISO 14644-1 compared to the previous version, as well as the possible impact on the Pharmaceutical EU GMP Annex 1 and FDA Aseptic Processing Guideline.