Ultra-pure water particle
Understanding Nanoparticle Contamination in Ultrapure Water (UPW) Systems

Semiconductor industry leaders have emphasized the importance of understanding nanoparticle contamination in ultrapure water (UPW) production and distribution. They have explored the advantage of monitoring particle baseline at 20 nm over the existing 50 nm particle performance of the state-of-art UPW system. Many interesting investigations on this space pivot around the motivations to study the value of monitoring particle size down to 20 nm at the UPW system.