As environmental system designers, we are often asked where to place sample points for particle monitoring, whether it be performed in a pharmaceutical cleanroom or clean device (RABS, isolator, etc.).
Through continuous process and equipment advancements, semiconductor manufacturers are approaching 14 nm feature sizes and heading even smaller, while hard-disk drive fly heights are now less than 10 nm. This ever-reducing device feature size requires comparable cleanliness-level improvements in ultrapure water (UPW). UPW purity is especially important with its high use in direct contact with wafers as a final cleaning and rinsing agent in many production steps. Leveraging recent advances in laser optics and detector technology, UPW particle concentration ≥20 nm (≥9 nm for metallic particles) can be effectively monitored.
Particle Measuring Systems just completed another successful MD&M show with strong results, meeting with current clients and reaching out to new businesses. Our show message was As experts in good manufacturing practice regulations (GMPs), microbiology and environmental monitoring, we help you assure sterility when and where you need it most. Supporting this statement, PMS brought a comprehensive range of microbial and particle products including the BioCapt Single Use Microbial Impactor and the MiniCapt Mobile Air Sampler. The Lasair III particle counter rounded out the contamination monitoring solutions. As a special attraction this year, PMS provided a sneak peek to the soon to be released SurCapt Microbial Surface Detection Kit (learn more next week).
Are your particle counters ISO 14644-1 compliant and able to be calibrated to all required tests according to ISO 21504-4?