February 24, 2016 10:20:02 AM


Written by Nina Morton

A Comparison of Particle Counting Solutions for UPW

d通过不断处理和先进的设备,半导体制造商往接近14纳米的特征尺寸和航向更小方向努力,然而硬盘驱动器浮动高度现在小于10纳米。这个不断减少器件特征尺寸需要比较超纯水(UPW)的清洁级的改进。 UPW纯度是在最多生产步骤高度直接使用晶片作为最终的清洁剂和漂洗剂显得尤其重要。利用激光光学和探测器技术,超纯水粒子浓度≥20纳米(≥9纳米金属颗粒)最新进展可以有效地监控。


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