使用Ultra DI® 20的超纯水系统监测

当硬盘飞行高度已经小于10nm,半导体制造业通过持续制程以及设备改进,进入了14nm时代,甚至更小。设备尺寸日益变小,相对应的,就需要改进超纯水中的清洁水平。超纯水的纯度特别重要,因为它常常在许多生产步骤中作为最终的清洁剂和清洗剂,直接接触圆晶片。据激光光学以及检测器技术的最新进展,超纯水粒子浓度≥20 nm (金属粒子≥9 nm),则可被有效地监测

Monitoring of UPW Systems Using Ultra DI20 cover

这个文件提供给您3种型号的超纯水粒子计数器之间的对比,帮助您确定适合您所需应用的最佳解决方案

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