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Application Note

Particle Monitoring Strategies in UPW: 300 mm Fabs

Abstract

Particle Monitoring Strategies in UPW: 300 mm Fabs

Process failures caused by particles in Ultra Pure Water (UPW) are relatively infrequent events, but with the move to 300 mm wafers and 90 nm line widths, they can have significant financial impact. Most particle monitoring strategies in the past focused on the use of the mobile and inline high sensitivity 0.05 micron particle counters. This paper examines the opportunities to improve performance, track data trends, and reduce cost by using a combination of both high sensitivity particle counters (to 0.03 microns) and less expensive lower sensitivity (0.1 microns) counters with very high sample volumes. The scope of this paper details the impact of size sensitivity, sample volume, and zero count level on particle counter performance. Practical monitoring considerations and particle distribution differences between poorly filtered and highly filtered systems are discussed.

Interested in learning more? Complete the form on this page to receive a free copy of the Particle Monitoring Strategies in UPW: 300 mm Fabs application note.

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Products

  • Aerosol Particle Counters
  • Liquid Particle Counters
  • Microbial Samplers
  • Molecular Monitors
  • BioCapt®Certificates of Analysis
  • Software / Data Management

Industries

  • Pharma
  • Semi
  • Contamination Monitoring Solutions for the Photonics & Optics Industry
  • Aerospace
  • Particle Measurement for Industrial Manufacturing

Applications

  • ISO 21501-4
  • USP 788
  • Parts Cleanliness Testing

Service & Support

Education and Training

  • Knowledge Center

About Us

  • COBE
  • Contact Particle Measuring Systems

Particle Measuring Systems- EN/CH

Reinluftweg 1
9630 Wattwil, Switzerland

T: +41 79 261 67 41
E: [email protected]

Keep in touch! Receive industry news from us:

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