Gilberto Dalmaso, Global Aseptic Process Development Manager at Particle Measuring Systems, has contributed to a newly released book with Rapid Microbial Methods (RMM), published by The Pharmaceutical and Healthcare Sciences Society. The book, titled PHSS Technical Mongraph No. 20 Bio-contamination, is a comprehensive review and best practice guide on bio-contamination characterization, risk profiling, control, monitoring and deviation management. It applies to controlled environments in GMP and non sterile applications where Bioburden control is required.
A New Rapid Microbiology Method based on Measuring Oxygen Depletion: An Assay for Testing Surfaces of Equipment, Facilities, and Personnel in Pharmaceutical Manufacturing Controlled Environments
Accredited calibrations for select products can now be conducted at the corporate headquarters with the latest international standard.
Aerospace greets a new dawn: Private companies now compete for opportunities to explore the boundaries of space. These ongoing aerospace opportunities demand newer ideas for detecting and reducing particulate contamination. Fewer particle-induced defects lead to higher yields, lower cost and greater reinvestments in aerospace development. Combined with the rapid advances in microelectromechanical systems (MEMs), detecting nanoparticles is critical. There are emerging particle counting technologies for aerospace industries that give data analysis to help decisions on mission-critical operations and minimize particulates in processes.
The Nano-ID® NPC10 NanoParticle Counter is the first condensation particle counter specifically developed for ultra-clean manufacturing environments. It provides meaningful data fast with its high flow rate and 10 nm particle detection. By combining a10 nm sensitivity with a high sample flow rate, it gives the lowest zero count specification on the market. The Nano-ID NPC10 NanoParticle Counter provides single particle detection for the cleanest manufacturing and testing applications, and 2.8 LPM flow rate allows for fast and statistically valid measurements.
Through continuous process and equipment advancements, semiconductor manufacturers are approaching 14 nm feature sizes and heading even smaller, while hard-disk drive fly heights are now less than 10 nm. This ever-reducing device feature size requires comparable cleanliness-level improvements in ultrapure water (UPW).
As your contamination monitoring needs increase, it’s important to continuously monitor when and where your products are at risk. Particle Measuring Systems has the application expertise to help you keep up with demand and reduce yield loss.
Time and again, our customers come to us looking for high-performance products to solve their most complex contamination monitoring challenges. Do any of these situations sound familiar to you?
Advance your knowledge of the technology needed to keep your environment free of microcontamination.
Learn the sources of contamination and how to improve your processes with a trip back to college – Particle College® that is.
How clean is it? Surface particulate contamination testing provides valuable information about the cleanliness of critical components.