A major objective in eliminating defects in these processes involves preventing the formation of haze on mirrors, lenses, masks, reticles, prisms and other optical components.
Archives for April 2021
Real-Time AMC Monitoring in Lithography to Prevent Defects
The successful implementation of advanced litho techniques has meant that the roadmap’s major challenges are no longer resolution dependent…
Virtual Demo: Antibacterial MiniCapt® Mobile Microbial Active Air Sampler from Particle Measuring Systems
Virtually demo the MiniCapt Mobile from Particle Measuring Systems and see how easy microbial active air sampling can be.
The Antibacterial MiniCapt® Mobile – For Best-in-Class Microbial Contamination Monitoring
The new MiniCapt® Mobile microbial contamination monitoring instrument, now with antibacterial housing to further reduce contamination introduced during monitoring activities.
Semiconductor Particle Contamination Control
Wet process equipment contains many components that are potential sources of particle contamination, and the ability to troubleshoot highly contaminating components in real-time without the need for offline laboratory analysis offers a significant benefit to equipment manufacturers.
Photomask Particle Testing Case Study
Data from the Chem 20™ Chemical Particle Counter can inform manufacturers on the benefit of strategic filtration systems. In this blog, we look at cleaning systems for ultrapure water and potassium hydroxide.
