Register now! Date: March 1, 2016 Time: 9:00 AM PST, 12:00 PM EST, 18:00 GMT+1 Personnel pose the greatest risk of false positives in aseptic processing. Investigations are required when microbial activity is detected, along with the risk of batch loss. Learn a new approach that eliminates false positives and costly investigations by preventing direct […]
New paper: ISO 14644 Revisions Summary
The recent revision of ISO 14644-1 and-2 has introduced several changes for cleanroom classification and monitoring guidelines. This paper highlights the major changes in the new ISO 14644-1 compared to the previous version, as well as the possible impact on the Pharmaceutical EU GMP Annex 1 and FDA Aseptic Processing Guideline.
New Microbial Testing Technology for Cleanrooms Announced by MOCON, Particle Measuring Systems
For immediate release
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Nina Morton
Particle Measuring Systems
+1 (303) 443-7100
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NEW MICROBIAL TESTING TECHNOLOGY FOR CLEANROOMS ANNOUNCED BY MOCON, PARTICLE MEASURING SYSTEMS
Minneapolis (February 3, 2016) – Cleanroom operators will now be able to detect the presence of extremely low levels of microbial cells on surfaces much faster than traditional solutions. The capability is a result of a global marketing agreement between MOCON, Inc. (NASDAQ: MOCO) and Particle Measuring Systems (PMS).
Liquid Particle Counter Workshop Held in Taiwan
Particle Measuring Systems recently brought together a panel of our particle counting experts to provide Taiwan industry leaders with a new approach for solving their microcontamination monitoring application issues. The workshop was called “Recent Measurement and Challenges in Nanoparticle Monitoring for Chemicals.” It was very well attended and provided our customers with the expert support they needed to solve their contamination problems.
Application notes: Monitoring ultrapure water systems
Through continuous process and equipment advancements, semiconductor manufacturers are approaching 14 nm feature sizes and heading even smaller, while hard-disk drive fly heights are now less than 10 nm. This ever-reducing device feature size requires comparable cleanliness-level improvements in ultrapure water (UPW).
Feeling puzzled? PMS experts at SEMICON West deliver solutions.
As your contamination monitoring needs increase, it’s important to continuously monitor when and where your products are at risk. Particle Measuring Systems has the application expertise to help you keep up with demand and reduce yield loss.
Time and again, our customers come to us looking for high-performance products to solve their most complex contamination monitoring challenges. Do any of these situations sound familiar to you?
Learn about particle technology from PMS experts.
Advance your knowledge of the technology needed to keep your environment free of microcontamination.
Attend our educational event about particle contaminants
Learn the sources of contamination and how to improve your processes with a trip back to college – Particle College® that is.
How clean is it? Surface particulate contamination and cleanliness testing
How clean is it? Surface particulate contamination testing provides valuable information about the cleanliness of critical components.