AiM 200 Surface Molecular Contamination Monitor: Press Release

Particle Measuring Systems introduces the AiM-200 real-time molecular contamination monitor. The AiM-200 monitors contamination on critical surfaces such as optics or wafers, where haze formation problems are caused by organic condensables in purge gases or in the ambient environment. Users can quantify in real-time the effect of trace acidic vapors that degrade exposed metal line structures and coated metallic surfaces. Chemical filter performance is easily tracked by monitoring for post-filter breakthrough of VOCs or acids.

The AiM-200 can be run with two sensors that allow two independent locations to be monitored simultaneously, has active temperature control to maintain a consistent operating environment, stores up to 50,000 samples, and operates with sample intervals as low as 10 seconds. Increased sensitivity allows for detection of mass depositions of 0.003 ng/cm2/Hz, and data can be downloaded to Excel via Ethernet or RS-232 communications, or collected in real-time using Facility Net Software.

Particle Measuring Systems is the industry leader in microcontamination monitoring. Particle Measuring Systems combines high-performance instrumentation with unrivaled applications expertise to solve the problems of semiconductor, disk drive and pharmaceutical manufacturers, and general cleanroom applications.

AiM is a registered trademark of Particle Measuring Systems, Inc.

Nina Akindele
Manager, Marketing and Communications
Particle Measuring Systems
303.443.7100 ext. 258
nakindele@pmeasuring.com