Cleanroom Molecular Contamination Monitoring Papers

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Reduce capital and labor costs for 193NM lithography monitoring of airborne molecular contamination (AMC) through proactive assessment and implementation of AMC monitoring techniques and strategies. Learn more now...

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Presentation: Real-time, continuous, point-of-use AMC monitor: AirSentry II Analyzer

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Presentation: Part-Per-Trillion Monitoring of Airborne Molecular Contamination (AMC)

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Presented February 2008 at the SPIE Advanced Litho Show

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Learn about the Ion Mobility Spectroscopy (IMS)technology for Airborne Molecular Contamination (AMC) monitoring.

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Published in Solid State Technology, Dec 2007.
Dedicated molecular contamination monitors based on ion mobility spectroscopy (IMS) can detect NH3 and SO2 contamination events in real time as well as provide ppt level trends through long term averaging. ...

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Webcast: Highlights of the ITRS Roadmap

Webcast

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A variety of technologies have been employed for both real-time and grab-sample monitoring. Employing a combination of both monitoring techniques affords the highest degree of control, lowest detection limits, and the most detailed data possible in terms of speciation. This study utilizes side by side comparisons of two different real-time monitors operating in parallel with both liquid impingers and dry sorbent tubes to measure NIST traceable gas standards as well as real world samples.

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Ion Mobility Spectroscopy (IMS) has gained widespread acceptance in many applications for detecting and identifying contaminant molecules. This paper will investigate how this technology works, look at the various industries that use IMS monitors, and discuss monitoring applications and examples.

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Recent technical advances have made it feasible to perform continuous real-time monitoring with significant advances in sensitivity and stability while minimizing sample tubing effects. These improvements are realized by using...

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Webcast: Getting the Most From Immersion Lithography

Webcast

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Click here to signup and download files (Real-time Monitors: Review and Lithography Applications)

Published in Semiconductor Fabtech 27th Edition. Author Robin Danfelt, Nikon Precision.

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