Surface Molecular Contamination Monitor: AiM®-200
The newest development in monitoring molecular contamination using Surface Acoustic Wave (SAW) technology. A high frequency, temperature controlled SAW sensor detects miniscule changes in mass on critical surfaces caused by interaction of organic and inorganic contaminants.
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Download the AiM 200 Non-Volatile Residue Monitor spec sheet... (143.1 KB)
- Improve Yield
- Alarms alert users to subtle or catastrophic changes in molecular contamination levels
- Localize contamination sources
- Protect photolithography optics and reticles by monitoring for organic condensables or crystal growth of ammonium sulfate
- Evaluate chemical filter performance to maximize filter lifetime
- Easy to Use
- Ethernet capability eases data transfer and communications
- Real-time data display and tracking via Facility Net software
- Sensor chip is easy to remove and to send for TOF/SIMS lab testing to identify contaminating species
- Controller LEDs and buttons allow user to quickly check power and probe status>
- Software menu allows easy setup and configuration changes
- Cost Effective
- Low capital investment and cost of ownership
- Data on deposition mass, deposition rate, sensor temperature, relative humidity, and statistical averaging of deposition rate
- Ethernet and RS-232 communications allow easy integration into Facility Net or other existing data management systems
- Sub-monolayer sensitivity allows SMC problems to be detected before they significantly damage product or process surfaces
- High-frequency sensors emulate product surfaces, omitting the need for costly wafers
- DUV Lithography
- Diffusion
- Purge gases
- Reticle and wafer storage
- Air handling systems
- Minienvironments
- Chemical filtration
- Aerospace optics
- Hard disk drive
- Acidic Gas Contamination Monitoring of Critical Surfaces in Semiconductor and Hard Disk Drive Manufacturing
- Evaluating Filtration of Airborne Molecular Contamination (AMC) Using Surface Acoustic Wave (SAW) Technology
- Monitoring Molecular Contamination of Critical Surfaces in Semiconductor Manufacturing
- Real-time Monitoring of Airborne Molecular Contamination (AMC)
- Real-time Monitors: Review and Lithography Applications
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Learn more about our microcontamination monitoring services.
This instrument is CE certified.
AiM® is a registered trademark of Particle Measuring Systems.
*U.S. patents and applications apply - US 5476002, US 5661226, US 6945090; U.S. and foreign patents pending.
Information on this website is subject to change without notice.
