Particle Monitoring for Advanced Process Controls

As feature sizes have gotten smaller and wafers have gotten bigger, the risk associated with contamination has grown accordingly. It is no longer sufficient to do occasional spot checks on the air, gas, or liquids that touch your product or affect your process tools. Process monitoring with real-time contamination data can prevent significant product loss, improve process tool performance, demonstrate compliance with warranty conditions, and provide additional insight into the process itself. Particle Measuring Systems has products for specifically designed to help you control your process by providing real-time information on both molecular and particulate contamination.

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