Moniteur de contamination moléculaire de surface : AiM-200

AiM 200 Non-Volatile Residue Monitor (143.1 KB)

• Improve Yield
• Alarms alert users to subtle or catastrophic changes in molecular contamination levels
• Localize contamination sources
• Protect photolithography optics and reticles by monitoring for organic condensables or crystal growth of ammonium sulfate
• Evaluate chemical filter performance to maximize filter lifetime
• Easy to Use
• Ethernet capability eases data transfer and communications
• Real-time data display and tracking via Facility Net software
• Sensor chip is easy to remove and to send for TOF/SIMS lab testing to identify contaminating species
• Controller LEDs and buttons allow user to quickly check power and probe status>
• Software menu allows easy setup and configuration changes
• Cost Effective
• Low capital investment and cost of ownership
• Data on deposition mass, deposition rate, sensor temperature, relative humidity, and statistical averaging of deposition rate
• Ethernet and RS-232 communications allow easy integration into Facility Net or other existing data management systems
• Sub-monolayer sensitivity allows SMC problems to be detected before they significantly damage product or process surfaces
• High-frequency sensors emulate product surfaces, omitting the need for costly wafers