Industry migration towards the 300 mm wafer has made the minienvironment a key feature in new semiconductor cleanrooms. For similar reasons, both the data storage and pharmaceutical industries have also moved to positive pressure enclosures designed to fit tightly around the tool.
Despite the significantly increased level of cleanliness, the minienvironment still requires monitoring for particles. However, this new environment has certain distinctive characteristics that require new monitoring techniques and equipment.
Based on our years of industry leadership in microcontamination management, Particle Measuring Systems has developed and applied for a patent on the MiniNet, an entirely new type of process monitor explicitly for monitoring minienvironments. The MiniNet is a process monitor designed to help the tool owner detect and diagnose conditions in which yield might be impacted by particulates.
Folha de Especificação MiniNet (335.4 KB)
For more information, please see the following:
A Informação deste Site está sujeita à alterações a qualquer momento sem aviso.