AiM-200: Surface Molecular Contamination Monitor
The newest development in monitoring molecular contamination using Surface Acoustic Wave (SAW) technology. A high frequency, temperature controlled SAW sensor detects miniscule changes in mass on critical surfaces caused by interaction of organic and inorganic contaminants.
- Improve Yield
- Alarms alert users to subtle or catastrophic changes in molecular contamination levels
- Localize contamination sources
- Protect photolithography optics and reticles by monitoring for organic condensables or crystal growth of ammonium sulfate
- Quantify organic contamination in diffusion that can damage gate oxide formation
- Evaluate chemical filter performance to maximize filter lifetime
- Detects very low levels of contamination
- Easy to Use
- Ethernet capability eases data transfer and communications
- Real-time data display and tracking via powerful Facility Net
- Sensor chip is easy to remove and to send for TOF/SIMS lab testing to identify contaminating species
- Controller LEDs and buttons allow user to quickly check power and probe status>
- Software menu allows easy setup and configuration changes
- Cost Effective
- Low capital investment and cost of ownership
- Data on deposition mass, deposition rate, sensor temperature, relative humidity, and statistical averaging of deposition rate
- Ethernet and RS-232 communications allow easy integration into Facility Net or other existing data management systems
- Sub-monolayer sensitivity allows SMC problems to be detected before they significantly damage product or process surfaces
- High-frequency sensors emulate product surfaces, omitting the need for costly wafers
- Photolithography
- Diffusion
- Purge gases
- Reticle and wafer storage
- Air handling systems
- Minienvironments
- Chemical filtration
- Aerospace optics
- Hard disk drive
Folha de Especificação AiM 200 (143.1 KB)
Real-time Monitoring of Airborne Molecular Contamination (AMC) (294.3 KB)
Monitoring Molecular Contamination of Critical Surfaces in Semiconductor Manufacturing (126.6 KB)
This instrument is CE certified.
AiM® is a registered trademark of Particle Measuring Systems.
U.S. patents and applications apply - US 5476002, US 5661226, US 6945090; U.S. and foreign patents pending.
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