Molecular contamination can result in costly damage and downtime, but prevention is simple with continuous, reliable, and accurate monitoring. Read below to learn about advances in molecular contamination monitoring.Topics
TOPICS
- Papers
- Monitoring Airborne Molecular Contamination
- Optimized Molecular Contamination Monitoring for Lithography
- Ion Mobility Theory and Applications
- Importance of SO2 Monitoring
- Products
- AirSentry II Airborne Monitor: Compact, Effective, and Affordable!
- AiM 200 Surface Molecular Contamination Monitor
- Frequently Asked Questions
- Webcast: Advanced Process Control Enables Next-Generation Devices
- Site Survey Testing Services
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PAPERS
Monitoring Airborne Molecular Contamination
Monitoring and controlling Airborne Molecular Contamination (AMC) has become essential in Deep Ultraviolet (DUV) photolithography for both optimizing yields and protecting tool optics. A variety of technologies have been employed for both real-time and grab-sample monitoring....
Optimized Molecular Contamination Monitoring for Lithography
A new approach to monitoring molecular contamination is now available. Recent technical advances have made it possible to perform continuous real-time monitoring with significant advances in sensitivity and stability while minimizing sample tubing effects. These improvements are realized by using a small, low-cost monitor, dedicated to monitoring a single location...
Ion Mobility Theory and Applications
Ion Mobility Spectroscopy (IMS) has gained widespread acceptance in many applications for detecting and identifying contaminant molecules. Learn how this technology works, look at various industries that use IMS monitors, and review monitoring applications and examples.
The Importance of SO2 Monitoring
Understand the importance of monitoring for Sulfur Dioxide (SO2) Airborne Molecular Contamination (AMC). This paper discuss different techniques for monitoring SO2 depending on the level of contamination and time allowed for monitoring.
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PRODUCTS
AirSentry II Ammonia/Acids Analyzers: Designed to minimize cost and maximize performance.
The AirSentry II provides ppt sensitivity, fast response, and increased selectivity at a low cost. Continuous coverage of a critical monitoring point and a central software platform allow for easy data acquisition and analysis.
Surface Molecular Contamination Monitor: AiM-200
Monitor molecular contamination using Surface Acoustic Wave (SAW) technology. A high frequency, temperature controlled SAW sensor detects miniscule changes in mass on critical surfaces caused by interaction of organic and inorganic contaminants.
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FREQUENTLY ASKED QUESTIONS (FAQs)
Our experts are available to answer your questions. Submit your question and our experts will respond directly to you.
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WEBCAST
Advanced Process Control Enables Next-Generation Devices
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SITE SURVEY TESTING SERVICES
Establishing a solid baseline and an understanding of the molecular contamination in a semiconductor fab is critical to protecting and enhancing yield. We offer a range of testing services to survey the contamination species and concentrations in ambient air, inside tools, pre/post filter, and in purge gases. New techniques and technologies offer easier sampling and improved trapping efficiency than ever before.
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Contact me to answer any questions that you may have or for a quote.
Ed Terrell
Particle Measuring Systems
Phone: (303) 944-9293
eterrell@pmeasuring.com
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Particle Measuring Systems is the global leader in microcontamination monitoring, with 35 years experience developing and manufacturing microcontamination monitors.
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